Browsing by Author "Huber, A."
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Publication Extraction of the carrier generation and recombination lifetime from the forward characteristics of advanced diodes
Oral presentation2002, E-MRS Spring Meeting Symposium E: Advanced Characterisation of Semiconductor Materials and DevicesPublication Extraction of the carrier generation and recombination lifetime from the forward characteristics of advanced diodes
Journal article2003, Materials Science and Engineering B, (102) 1_3, p.189-192Publication Impact of hydrogen on oxygen precipitation and gate oxide integrity after RTA processing
;Möller, T. ;Obermeier, G. ;Bearda, Twan ;Huber, A. ;Schmolke, R. ;von Ammon, W.Lerch, W.Proceedings paper2001, GADEST 2001 - Proceedings of the 9th International Autumn Meeting Gettering and Defect Engineering in Semiconductor Technology;, p.127-132Publication Impact of state-of-the-art Cz substrates on the current-voltage characteristics of shallow p-n junctions
Proceedings paper2002, Semiconductor Silicon 2002. Proceedings of the 9th International Symposium on Silicon Materials Science and Technology, 13/05/2002, p.695-704Publication Vapor phase decomposition - droplet collection evalutation of a wafer surface preparation system
Proceedings paper2000, Cleaning Technology in Semiconductor Device Manufacturing. Proceedings of the 6th International Symposium, 17/10/1999, p.593-600Publication Vapor phase decomposition - droplet collection. Can we improve the collection efficiency for copper contamination?
Oral presentation1998, 4th International Symposium on Ultra Clean Processing of Silicon Surfaces - UCPSSPublication Vapor phase decomposition - droplet collection. Can we improve the collection efficiency for copper contamination?
Proceedings paper1999, Ultra Clean Processing of Silicon Surfaces; Proceedings of the 4th International Symposium on Ultra Clean Processing of Silicon, 21/09/1998, p.93-96Publication Vapor phase decomposition - droplet collection: Evalutation of a wafer surface preparation system
Meeting abstract1999, Electrochemical Society Fall Meeting: 6th International Symposium on Cleaning Technology in Semiconductor Device Manufacturing, 17/10/1999, p.1125