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Browsing by Author "Jiang, J."

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    Creative metrology development for EUVL: Flare and out-of-band qualification

    Lorusso, Gian  
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    Hendrickx, Eric  
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    Davydova, N.
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    Peng, Y.
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    Eurlings, M.
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    Feenstra, K.
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    Jiang, J.
    Oral presentation
    2011, 55th International conference on Electron, Ion and Photon Beam Technology and Nanofabrication - EIPBN
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    Model calibration and validation for pre-production EUVL

    Lorusso, Gian  
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    Van de Kerkhove, Jeroen  
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    De Bisschop, Peter  
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    Hendrickx, Eric  
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    Jiang, J.
    ;
    Rio, David  
    Proceedings paper
    2012, Extreme Ultraviolet (EUV) Lithography III, 12/02/2012, p.83221L
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    Separable models for computational lithography

    Liu, Hua-Yu
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    Zhao, Q.
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    Chen, J.F.
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    Jiang, J.
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    Socha, B.
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    Van Setten, E.
    ;
    Engelen, A.
    ;
    Meessen, J.
    Proceedings paper
    2008, Photomask and Next-Generation Lithography Mask Technology XV, 16/04/2008, p.70280X

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