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Browsing by Author "Khaira, Damon"

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    Probability prediction of EUV process failure due to resist-exposure stochastic: applications of Gaussian random fields excursions and Rice's formula

    Latypov, Azat
    ;
    Khaira, Damon
    ;
    Fenger, Germain
    ;
    Sturtevant, John
    ;
    Wei, Chih-I
    ;
    De Bisschop, Peter  
    Proceedings paper
    2020, Extreme Ultraviolet (EUV) Lithography XI; 113230L (2020), 23/02/2020, p.113230L

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