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    EUV pattern shift compensation strategies

    Schmoeller, Thomas
    ;
    Klimpel, Thomas
    ;
    Kim, In Sung
    ;
    Lorusso, Gian  
    ;
    Myers, Alan
    ;
    Jonckheere, Rik  
    Proceedings paper
    2008, Emerging Lithographic Technologies XII, 24/02/2008, p.69211B

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