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Browsing by Author "Kocsis, M."

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    28nm pitch single exposure patterning readiness by metal oxide resist on 0.33NA EUV Lithography

    Kim, Il Hwan
    ;
    Kim, Insung
    ;
    Park, Changmin
    ;
    Lee, Jsiun
    ;
    Ryu, Koungmin
    ;
    De Schepper, P.
    ;
    Doise, J.
    Proceedings paper
    2021, Conference on Extreme Ultraviolet (EUV) Lithography XII, FEB 22-26, 2021, p.116090Q

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