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Browsing by Author "Lee, S."

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    Al speed fill

    Beyer, Gerald  
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    Maex, Karen  
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    Daniels, Stephen
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    Lee, S.
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    Proost, Joris
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    Bender, Hugo  
    Journal article
    1999, Materials Science in Semiconductor Processing, (2) 1, p.75-78
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    Ge deep sub-micron pFETs with etched TaN metal gate on a High-K dielectric, fabricated in a 200mm silicon prototyping line

    De Jaeger, Brice  
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    Houssa, Michel  
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    Satta, Alessandra
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    Kubicek, Stefan  
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    Verheyen, Peter  
    Proceedings paper
    2004, Proceedings of the 34th European Solid-State Device Research Conference - ESSDERC, 21/09/2004, p.189-192
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    Germanium deep-sub micron PMOS transistors with etched TaN metal gate on a high-k dielectric, fabricated in a 200mm prototyping line

    Meuris, Marc  
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    De Jaeger, Brice  
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    Kubicek, Stefan  
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    Verheyen, Peter  
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    Van Steenbergen, Jan  
    Proceedings paper
    2004, SiGe: Materials, Processing, and Devices. Proceedings of the 1st International Sympsoium, 3/10/2004, p.693-700
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    Innovative characterization techniques for ultra-scaled FinFETs

    Tettamanzi, G.C.
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    Lansbergen, G.P.
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    Verduijn, J.
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    Rahman, R.
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    Paul, A.
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    Lee, S.
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    Collaert, Nadine  
    Proceedings paper
    2010, 10th IEEE International Conference on Nanotechnology and Joint Symposium with Nano Korea, 17/08/2010, p.25-30
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    Integrating high-k dielectrics: etched polysilicon or metal gates?

    Schram, Tom  
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    Beckx, Stephan  
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    De Gendt, Stefan  
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    Vertommen, Johan
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    Lee, S.
    Journal article
    2003, Solid State Technology, (46) 6, p.61-64
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    Sub-threshold study of undoped trigate nFinFET

    Tettamanzi, Giuseppe C.
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    Lansbergen, G.P.
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    Paul, Abhijeet
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    Lee, S.
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    Deosaran, P.A.
    Journal article
    2010, Thin Solid Films, (518) 9, p.2521-2523
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    TaN metal gate MOSFETs with agressively scaled HfO2 dielectrics

    Lander, Rob
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    Schram, Tom  
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    Lujan, Guilherme
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    Hooker, Jacob
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    Vertommen, Johan
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    Lee, S.
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    Deweerd, Wim
    Proceedings paper
    2003, Advanced Short-Time Thermal Processing for Si-based CMOS devices, 27/04/2003, p.367-374

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