Browsing by Author "Lin, J.C."
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Publication Impact of EOT scaling down to 0.85nm on 70nm Ge-pFETs technology with STI
Proceedings paper2009, Symposium on VLSI Technology, 15/06/2009, p.82-83Publication Use of p- and n-type vapor phase doping and sub-melt laser anneal for extension junctions in sub-32 nm CMOS technology
Journal article2010, Thin Solid Films, (518) 6, Suppl. 1, p.S48-S52