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Browsing by Author "Locke, Klaus"

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    Elimination of HF-last cleaning related CoSi2 defects formation

    Zou, Gang
    ;
    Jonckx, Franky
    ;
    Alves Donaton, Ricardo
    ;
    Kuper, Werner
    ;
    Maex, Karen  
    ;
    Mertens, Paul  
    Proceedings paper
    1994, Proceedings of the 2nd International Symposium on Ultra Clean Processing of Silicon Surfaces - UCPSS, 19/09/1994, p.177-180
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    Marangoni drying: a new concept for drying silicon wafers

    Schild, R.
    ;
    Locke, Klaus
    ;
    Kozak, M.
    ;
    Heyns, Marc  
    Proceedings paper
    1994, Proceedings of the 2nd International Symposium on Ultra Clean Processing of Silicon Surfaces - UCPSS, 19/09/1994, p.31-34

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