Browsing by Author "Lokasani, Ragava"
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Publication Assessment of challenges in EUV resist outgassing and contamination characterization
Journal article2012, Journal of Photopolymer Science and Technology, (25) 5, p.609-616Publication EUV outgassing and contamination in multilayer material schemes
Proceedings paper2011, International Symposium on Extreme Ultraviolet Lithography - EUVL, 17/10/2011Publication Imec update on resist outgassing qualification
Oral presentation2012, IEUVI Resist TWG MeetingPublication Outgassing studies on EUV underlayers containing PAGs
Proceedings paper2011, International Symposium on Extreme Ultraviolet Lithography - EUVL, 17/10/2011Publication Progress in understanding EUV resist related outgassing and contamination
Oral presentation2012, International Symposium on Extreme Ultraviolet Lithography - EUVLPublication Relationship between resist outgassing and witness sample contamination in NXE outgas qualification using electrons and EUV
Proceedings paper2013, Extreme Ultraviolet (EUV) Lithography IV, 24/02/2013, p.86790K