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Browsing by Author "Luehrmann, P."

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    248 nm lithography for the 0.18 μm generation

    Vandenberghe, Geert  
    ;
    Tzviatkov, Plamen
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    Yen, Anthony
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    Ronse, Kurt  
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    Van den hove, Luc  
    Proceedings paper
    1996, Proceedings of the Microlithography Seminar INTERFACE'96, 27/10/1996, p.29-42
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    CD control comparison of step & repeat versus step & scan DUV lithography for sub-0.25 μm gate printing

    Ronse, Kurt  
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    Maenhoudt, Mireille
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    Marschner, Thomas
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    Van den hove, Luc  
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    Streefkerk, B.
    Proceedings paper
    1998, Optical Microlithography XI, 25/02/1998, p.56-66
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    Sub-0.25 micron lithography applying illumination pupil filtering (quadrupole) on a DUV step-and-repeat system

    Finders, Jo
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    Mulders, A. M.
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    Krist, J.
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    Flagello, D.
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    Luehrmann, P.
    ;
    Maenhoudt, Mireille
    Proceedings paper
    1998, OLIN Microlithography Symposium. Interface '98, 15/11/1998, p.81-92

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