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Browsing by Author "Maslow, Mask"

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    Impact of EUV resist thickness on local critical dimension uniformities for sub-30 nm CD Via Patterning

    Vincent, Benjamin  
    ;
    Maslow, Mask
    ;
    Bekaert, Joost  
    ;
    Mao, Ming  
    ;
    Ervin, Joseph
    Proceedings paper
    2020, Extreme Ultraviolet (EUV) Lithography XI, part of SPIE Advanced Lithography, 23/02/2020, p.1132326

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