Browsing by Author "Maurer, Wilhelm"
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Publication Assessment of OPC effectiveness using two-dimensional metrics
Proceedings paper2002, Optical Microlithography XV, 5/03/2002, p.395-406Publication Complementary dipole exposure solutions at 0.29k1
Proceedings paper2005, Optical Microlithography XVIII, 27/02/2005, p.327-338Publication OPC aware mask and wafer metrology
Proceedings paper2002, 18th European Conference on Mask Technology for Integrated Circuits and Microcomponents, 14/01/2002, p.175-181Publication Physically-based compact models for fast lithography simulation