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    Low voltage stress-induced leakage current in 1.4 - 2.1 nm SiON and HfSiON gate dielectric layers

    O'Connor, Robert
    ;
    McDonnell, Stephen
    ;
    Hughes, Greg
    ;
    Degraeve, Robin  
    ;
    Kauerauf, Thomas
    Journal article
    2005-08, Semiconductor Science and Technology, 20, p.668-672

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