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Browsing by Author "Megged, Efi"

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    Optical Overlay Metrology Challenges in Next-Gen Semiconductor Nodes

    Katz, Shlomit
    ;
    Leray, Philippe  
    ;
    Yang, Hongcheon  
    ;
    Cho, Yongmin  
    ;
    Blanco, Victor  
    ;
    Gronheid, Roel
    Proceedings paper
    2026, Metrology, Inspection, and Process Control XL, 2026-02-22, p.139811A
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    Optimization toward Non-Zero Offset Stability in Overlay Control: Trends and Prospects

    Gutman, Nadav
    ;
    Baudemprez, Bart  
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    Yang, Hongcheon  
    ;
    Beral, Christophe  
    ;
    Charley, Anne-Laure  
    Proceedings paper
    2025, 2025 Conference on Metrology Inspection and Process Control-Annual, 2025-02-24, p.134260I-1-134260I-7

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