Browsing by Author "Melvin III, Lawrence S."
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Publication Binary modeling method to check the sub-resolution assist features (SRAFs) printability
Proceedings paper2012, Optical Microlithography XXV, 12/02/2012, p.83261DPublication Mask absorber, mask tone, and wafer process impact on resist line-edge-roughness
Journal article2023, JOURNAL OF MICRO-NANOPATTERNING MATERIALS AND METROLOGY-JM3, (22) 4, p.Art. 044801Publication Wafer level response to mask deficiencies in 0.55-numerical aperture extreme ultraviolet photolithography