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    Advances and challenges in dual-tone development process optimization

    Fonseca, Carlos
    ;
    Somervell, Mark
    ;
    Scheer, Steven  
    ;
    Printz, Wallace
    ;
    Nafus, Kathleen  
    Proceedings paper
    2009, Optical Microlithography XXII, 22/02/2009, p.72740I

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