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Browsing by Author "Richter, Rigo"

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    AIMS TM 45 inspection of CH treated with inverse lithography

    Hendrickx, Eric  
    ;
    Birkner, Robert
    ;
    Kempsell, Monica
    ;
    Tritchkov, Alexander
    ;
    Richter, Rigo
    Proceedings paper
    2008, 5th International Symposium on Immersion Lithography Extensions, 22/09/2008
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    Impact of alternative mask stacks on the imaging performance at NA 1.20 and above

    Philipsen, Vicky  
    ;
    Mesuda, Kei
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    De Bisschop, Peter  
    ;
    Erdmann, Andreas
    ;
    Citarella, Giuseppe
    Proceedings paper
    2007, SPIE Photomask Technology (BACUS), 18/09/2007, p.67301N
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    Test of vector effect emulation of the AIMSTM45-193i

    De Bisschop, Peter  
    ;
    Philipsen, Vicky  
    ;
    Birkner, Robert
    ;
    Richter, Rigo
    ;
    Scheruebl, Thomas
    Oral presentation
    2007, 4th International Immersion Lithography Symposium
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    Using the AIMS 45-193i for hyper-NA imaging applications

    De Bisschop, Peter  
    ;
    Philipsen, Vicky  
    ;
    Birkner, Robert
    ;
    Buttgereit, Uwe
    ;
    Richter, Rigo
    Proceedings paper
    2007, SPIE Photomask Technology (BACUS), 18/09/2007, p.67301G

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