Browsing by Author "Samajdar, I."
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Publication Electromigration-induced drift in damascene vs. conventional interconnects: an intrinsic difference
Proceedings paper1998, Materials Reliability in Microelectronics VIII, 13/04/1998, p.89-94Publication The role of grain boundary structure on electromigration-induced drift in pure Al and Al(0.5wt% Cu)
Journal article1998, Scripta Materialia, (39) 8, p.1039-1045