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Browsing by Author "Scheruebl, T."

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    AIMS-45 image validation of contact hole patterns after inverse lithography at NA 1.35

    Hendrickx, Eric  
    ;
    Birkner, R.
    ;
    Kempsell, Monica
    ;
    Tritchkov, A.
    ;
    Vandenberghe, Geert  
    Proceedings paper
    2008, Photomask Technology 2008, 7/10/2008, p.71221E

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