Browsing by Author "Seidel, Dirk"
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Publication Phame: phase measurements on 45nm node phase shift features
Proceedings paper2008, Photomask and Next-Generation Lithography Mask Technology XV, 16/04/2008, p.70282ZPublication Phase behavior through pitch and duty cycle and its impact on process window
Proceedings paper2009, Photomask and Next-Generation Lithography Mask Technology XVI, 8/04/2009, p.737916