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Browsing by Author "Sejpal, R."

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    Realizing more accurate OPC models by utilizing SEM contours

    Wei, C.
    ;
    Sejpal, R.
    ;
    Deng, Y.
    ;
    Kusnadi, I.
    ;
    Fenger, G.
    ;
    Oya, M.
    ;
    Okamoto, Y.
    ;
    Maruyama, K.
    ;
    Yamazaki, Y.
    Proceedings paper
    2020, Metrology, Inspection, and Process Control for Microlithography XXXIV, 23/03/2020, p.1132524

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