Browsing by Author "Shin, Youngsoo"
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Publication 2D self-aligned via patterning strategy with EUV single exposure in 3nm technology
Proceedings paper2017, Extreme Ultraviolet (EUV) Lithography VIII, 26/02/2017, p.1014321Publication Large marginal 2D self-aligned via patterning for sub-5nm technology
Proceedings paper2017, Design-Process-Technology Co-optimization for Manufacturability XI, 26/02/2017, p.101480J