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Browsing by Author "Singh, Sherjang"

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    Effective EUVL mask cleaning technology solutions for mask manufacturing and in-fab mask maintenance

    Dietze, Uwe
    ;
    Dress, Peter
    ;
    Waehler, Tobias
    ;
    Singh, Sherjang
    ;
    Jonckheere, Rik  
    ;
    Baudemprez, Bart  
    Proceedings paper
    2011, 27th European Mask and Lithography Conference - EMLC, 18/01/2011, p.79850N
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    Effective solutions for in-fab EUVL mask cleaning

    Wähler, Tobias
    ;
    Singh, Sherjang
    ;
    Dietze, Uwe
    ;
    Jonckheere, Rik  
    ;
    Baudemprez, Bart  
    Proceedings paper
    2010, International Symposium on Extreme Ultraviolet Lithography, 20/10/2010
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    Preserving printed wafer CD stability in high-frequency EUVL mask cleaning

    Wähler, Tobias
    ;
    Singh, Sherjang
    ;
    Dietze, Uwe
    ;
    Jonckheere, Rik  
    ;
    Ronse, Kurt  
    ;
    Baudemprez, Bart  
    Proceedings paper
    2011, International Symposium on Extreme Ultraviolet Lithography - EUVL, 17/10/2011
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    Techniques for removal of contamination from EUVL mask without surface damage

    Singh, Sherjang
    ;
    Chen, Ssuwei
    ;
    Wähler, Tobias
    ;
    Jonckheere, Rik  
    ;
    Liang, Ted
    ;
    Chen, Robert J.
    Proceedings paper
    2010, Extreme Ultraviolet (EUV) Lithography, 21/02/2010, p.76360Y

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