Browsing by Author "Takahata, Yosuke"
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Publication Mask absorber, mask tone, and wafer process impact on resist line-edge-roughness
Journal article2023, JOURNAL OF MICRO-NANOPATTERNING MATERIALS AND METROLOGY-JM3, (22) 4, p.Art. 044801Publication Study of mask error enhancement factor improvement with low-n absorber extreme ultraviolet lithography mask
Journal article2024, JOURNAL OF MICRO-NANOPATTERNING MATERIALS AND METROLOGY-JM3, (23) 4, p.Art. 044401