Browsing by Author "Thiam, A."
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Publication Patterning process and electrical yield optimization at the limits of single exposure EUV 0.33 NA: a pitch 26nm damascene process
; ; ; ;Nafus, K. ;Feurprier, Y. ;Thiam, A.Hsu, A.Proceedings paper2024, 2024 International Interconnect Technology Conference, 2024-06-24