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Browsing by Author "Wada, M"

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    Applicable solvent photoresist strip process for high-k/metal gate

    Wada, M
    ;
    Takahashi, H
    ;
    Snow, J
    ;
    Vos, Rita  
    ;
    Mertens, PW
    ;
    Shirakawa, H
    Meeting abstract
    2010, 10th International Symposium on Ultra-Clean Processing of Semiconductor Devices - UCPSS, 20/09/2010, p.78-79
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    Cleaning and surface preparation for SiGe and Ge channel device

    Wada, M
    ;
    Takahashi, H
    ;
    Snow, J
    ;
    Vos, Rita  
    ;
    Mertens, Paul  
    ;
    Shirakawa, H
    Meeting abstract
    2010, 10th International Symposium on Ultra-Clean Processing of Semiconductor Devices - UCPSS, 20/09/2010, p.7.3

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