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Browsing by Author "Waiblinger, Markus"

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    Ebeam based mask repair as door opener for defect free EUV masks

    Waiblinger, Markus
    ;
    Bret, Tristan
    ;
    Jonckheere, Rik  
    ;
    Van Den Heuvel, Dieter  
    Proceedings paper
    2012, Photomask Technology, 11/09/2012, p.85221M
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    Repair of natural EUV reticle defects

    Jonckheere, Rik  
    ;
    Bret, Tristan
    ;
    Van Den Heuvel, Dieter  
    ;
    Magana, John F.
    ;
    Gao, Weimin
    Proceedings paper
    2011, Photomask technology 2011, 19/09/2011, p.81661G
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    Study of multilayer defects on sub-32nm HP EUV reticles

    Van Den Heuvel, Dieter  
    ;
    Jonckheere, Rik  
    ;
    Bret, Tristan
    ;
    Waiblinger, Markus
    Oral presentation
    2012, International Symposium on Extreme Ultraviolet Lithography - EUVL
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    The door opener for EUV mask repair

    Waiblinger, Markus
    ;
    Jonckheere, Rik  
    ;
    Bret, Tristan
    ;
    Van Den Heuvel, Dieter  
    ;
    Baur, C
    ;
    Baralia, G
    Proceedings paper
    2012, Photomask and Next-Generation Lithography Mask Technology XIX, 17/04/2012, p.84410F

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