Browsing by Author "Yasui, Naoki"

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Application of model-based library approach to photoresist pattern shape measurement in advenced lithography

Yasui, Naoki
;
Isawa, Miki
;
Ishimoto, Toru
;
Sekiguchi, Kohei
;
Tanaka, Maki
;
Osaki, Mayuka
Proceedings paper
2010, Metrology, Inspection and Process Control for Microlithography XXIV, 21/02/2010, p.76382O
Study on practical application of pattern top resist loss measurement by CD-SEM for high NA immersion lithography

Ishimoto, Toru
;
Yasui, Naoki
;
Hasegawa, Norio
;
Tanaka, Maki
;
Cheng, Shaunee
Proceedings paper
2010, Metrology, Inspection and Process Control for Microlithography XXIV, 21/02/2010, p.76382P