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Browsing by Author "Yoshizawa, Masaki"

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    Impact of the absorber thickness variation on the imaging performance of ArF immersion lithography

    Yoshizawa, Masaki
    ;
    Philipsen, Vicky  
    ;
    Leunissen, Peter
    Proceedings paper
    2005, Fundamental Problems of Optoelectronics and Microelectronics II, 13/04/2005, p.243-251
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    The impact of hyper NA immersion lithography to reticles and design

    Ronse, Kurt  
    ;
    Cheng, Shaunee
    ;
    Ercken, Monique  
    ;
    Leunissen, Peter
    ;
    Maenhoudt, Mireille
    Proceedings paper
    2005, Semicon STS Japan, 8/12/2005

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