Now showing items 1-3 of 3

    • Integration of a k=2.3 spin-on polymer for the sub-28nm technology node 

      Wilson, Chris; Lazzarino, Frederic; Truffert, Vincent; Kirimura, Tomoyuki; de Marneffe, Jean-Francois; Verdonck, Patrick; Hirai, M.; Nakatani, K.; Tada, M.; Heylen, Nancy; El-Mekki, Zaid; Vanstreels, Kris; Van Besien, Els; Ciofi, Ivan; Stucchi, Michele; Croes, Kristof; Zhang, Liping; Demuynck, Steven; Ercken, Monique; Xu, Kaidong; Baklanov, Mikhaïl; Tokei, Zsolt (2012)
    • Integration of an organic ultra low-k (k=2.2) material 

      Pantouvaki, Marianna; Zhao, Larry; Huffman, Craig; Heylen, Nancy; Ferchichi, Abdelkarim; Ono, Y.; Nakajima, M.; Nakatani, K.; Struyf, Herbert; Beyer, Gerald; Baklanov, Mikhaïl (2009)
    • Integration of an organic ultra low-k (k=2.2) material 

      Pantouvaki, Marianna; Zhao, Larry; Huffman, Craig; Heylen, Nancy; Ferchichi, Abdelkarim; Ono, Y.; Nakajima, M.; Nakatani, K.; Struyf, Herbert; Beyer, Gerald; Baklanov, Mikhaïl (2010)