Browsing by author "Demmerle, Wolfgang"
Now showing items 1-5 of 5
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Application of an inverse Mack model for negative tone development simulation
Gao, Weimin; Klostermann, Ulrich; Mülders, Thomas; Schmoeller, Thomas; Demmerle, Wolfgang; De Bisschop, Peter; Bekaert, Joost (2011) -
Experimental validation of rigorous, 3D profile models for negative-tone develop resists
Gao, Weimin; Klostermann, Ulrich; Kamohara, Itaru; Schmoeller, Thomas; Lucas, Kevin; Demmerle, Wolfgang; De Bisschop, Peter; Mailfert, Julien (2014) -
Experimental validation of stochastic modeling for negative-tone develop EUV resist
Kamohara, Itaru; Gao, Weimin; Klostermann, Ulrich; Schmöller, Thomas; Demmerle, Wolfgang; Lucas, Kevin; De Simone, Danilo; Hendrickx, Eric; Vandenberghe, Geert (2015) -
Patterning process exploration of metal 1 layer in 7nm node with 3D pattering flow simulations
Gao, Weimin; Ciofi, Ivan; Saad, Yves; Matagne, Philippe; Bachman, Michael; Oulmane, Mohamed; Gillijns, Werner; Lucas, Kevin; Demmerle, Wolfgang; Schmoeller, Thomas (2015) -
Prediction of EUV stochastic microbridge probabilities by lithography simulations
Verduijn, Erik; Welling, Ulrich; Tang, Jiuzhou; Stock, Hans-Jurgen; Klostermann, Ulrich; Demmerle, Wolfgang; De Bisschop, Peter (2020)