Browsing by author "Toledo de Carvalho Cavalcante, Camila"
Now showing items 1-2 of 2
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Impact of Nitridation on Bias Temperature Instability and Hard Breakdown Characteristics of SiON MOSFETs
Tyaginov, Stanislav; O'Sullivan, Barry; Vaisman Chasin, Adrian; Rawal, Yaksh; Chiarella, Thomas; Toledo de Carvalho Cavalcante, Camila; Kimura, Yosuke; Vandemaele, Michiel; Ritzenthaler, Romain; Mitard, Jerome; Vadakupudhu Palayam, Senthil; Reifsnider, Jason; Kaczer, Ben (2023) -
Low temperature source / drain epitaxy and functional silicides: essentials for ultimate contact scaling
Porret, Clément; Everaert, Jean-Luc; Schaekers, Marc; Ragnarsson, Lars-Ake; Hikavyy, Andriy; Rosseel, Erik; Rengo, Gianluca; Loo, Roger; Khazaka, R.; Givens, M.; Piao, Xiaoyu; Mertens, Sofie; Heylen, Nancy; Mertens, Hans; Toledo de Carvalho Cavalcante, Camila; Sterckx, Gunther; Brus, Stephan; Nalin Mehta, Ankit; Korytov, Maxim; Batuk, Dmitry; Favia, Paola; Langer, Robert; Pourtois, Geoffrey; Swerts, Johan; Dentoni Litta, Eugenio; Horiguchi, Naoto (2022)