Browsing by author "Mesilhy, Hazem"
Now showing items 1-8 of 8
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Attenuated phase shift mask for extreme ultraviolet: can they mitigate three-dimensional mask effects?
Erdmann, Andreas; Evanschitzky, Peter; Mesilhy, Hazem; Philipsen, Vicky; Hendrickx, Eric; Bauer, Markus (2018) -
Attenuated PSM for EUV: Can they mitigate 3D mask effects?
Erdmann, Andreas; Evanschitzky, Peter; Mesilhy, Hazem; Philipsen, Vicky; Hendrickx, Eric; Bauer, Markus (2018) -
Mask absorber for next generation EUV lithography
Wu, Meiyi; Thakare, Devesh; De Marneffe, Jean-Francois; Jaenen, Patrick; Souriau, Laurent; Opsomer, Karl; Soulie, Jean-Philippe; Erdmann, Andreas; Mesilhy, Hazem; Naujok, Philipp; Foltin, Markus; Soltwisch, Victor; Saadeh, Qais; Philipsen, Vicky (2020) -
Perspectives and tradeoffs of absorber materials for high NA EUV lithography
Erdmann, Andreas; Mesilhy, Hazem; Evanschitzky, Peter; Philipsen, Vicky; Timmermans, Frank; Bauer, Markus (2020) -
Perspectives and tradeoffs of novel absorber materials for high NA EUV lithography
Erdmann, Andreas; Mesilhy, Hazem; Evanschitsky, Peter; Philipsen, Vicky; Timmermans, Frank; Bauer, Markus (2020) -
Precise optical constants: determination and impact on metrology, simulation and development of EUV masks
Saadeh, Qais; Mesilhy, Hazem; Soltwisch, Victor; Erdmann, Andreas; Ciesielski, Richard; Lohr, Leonhard; Andrle, Anna; Philipsen, Vicky; Thakare, Devesh; Laubis, Christian; Scholze, Frank; Kolbe, Michael (2022) -
Simulation of polychromatic effects in high NA EUV lithography
Erdmann, Andreas; Mesilhy, Hazem; Evanschitzky, Peter; Saadeh, Qais; Soltwisch, Victor; Bihr, Simon; Zimmermann, Joerg; Philipsen, Vicky (2021) -
Study of novel EUVL mask absorber candidates
Wu, Meiyi; Thakare, Devesh; De Marneffe, Jean-Francois; Jaenen, Patrick; Souriau, Laurent; Opsomer, Karl; Soulie, Jean-Philippe; Erdmann, Andreas; Mesilhy, Hazem; Naujok, Philipp; Foltin, Markus; Soltwisch, Victor; Saadeh, Qais; Philipsen, Vicky (2021)