Mask absorber for next generation EUV lithography

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Authors
Wu, Meiyi; Thakare, Devesh; De Marneffe, Jean-Francois; Jaenen, Patrick; Souriau, Laurent; Opsomer, Karl; Soulie, Jean-Philippe; Erdmann, Andreas; Mesilhy, Hazem; Naujok, Philipp; Foltin, Markus; Soltwisch, Victor; Saadeh, Qais; Philipsen, Vicky
DOI
10.1117/12.2572114
EISBN
978-1-5106-3843-3
ISSN
0277-786X
Conference
Conference on Extreme Ultraviolet Lithography
Journal
Proceedings of SPIE
Volume
11517
Title
Mask absorber for next generation EUV lithography
Publication type
Proceedings paper
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220.500.12860/38081.2*2022-01-18T10:39:00Zvalidation by library/open access desk
120.500.12860/380812021-11-02T16:03:40Z

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