Browsing by author "Erdmann, Andreas"
Now showing items 1-20 of 22
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Analysis of EUV mask multilayer defect printing characteristics
Erdmann, Andreas; Evanschitzky, Peter; Bret, Tristan; Jonckheere, Rik (2012) -
Attenuated phase shift mask for extreme ultraviolet: can they mitigate three-dimensional mask effects?
Erdmann, Andreas; Evanschitzky, Peter; Mesilhy, Hazem; Philipsen, Vicky; Hendrickx, Eric; Bauer, Markus (2018) -
Attenuated PSM for EUV: Can they mitigate 3D mask effects?
Erdmann, Andreas; Evanschitzky, Peter; Mesilhy, Hazem; Philipsen, Vicky; Hendrickx, Eric; Bauer, Markus (2018) -
Characterization and mitigation of 3D mask effects
Erdmann, Andreas; Xu, Dongbo; Evanschitzky, Peter; Philipsen, Vicky; Luong, Vu; Hendrickx, Eric (2017) -
Characterization and mitigation of 3D mask effects in EUV lithography
Erdmann, Andreas; Xu, Dongbo; Evanschitzky, Peter; Luong, Vu; Philipsen, Vicky; Hendrickx, Eric (2016) -
Exploration of alternative absorber materials for EUV lithography: A simulation study
Erdmann, Andreas; Evanschitzky, Peter; Xu, Dongbo; Luong, Vu; Philipsen, Vicky; Hendrickx, Eric (2016) -
Impact of alternative mask stacks on the imaging performance at NA 1.20 and above
Philipsen, Vicky; Mesuda, Kei; De Bisschop, Peter; Erdmann, Andreas; Citarella, Giuseppe; Evanschitzky, Peter; Birkner, Robert; Richter, Rigo; Scherübl, Thomas (2007) -
Increasing the predictability of AIMS measurements by coupling to resist simulations
Meliorisz, Balint; Erdmann, Andreas; Schnattinger, Thomas; Strössner, Ulrich; Scherübl, Thomas; De Bisschop, Peter; Philipsen, Vicky (2008) -
Mask absorber development to enable next-generation EUVL
Philipsen, Vicky; Luong, Vu; Opsomer, Karl; Souriau, Laurent; Rip, Jens; Detavernier, Christophe; Erdmann, Andreas; Evanschitzky, Peter; Laubis, Christian; Hoenicke, Philipp; Soltwisch, Victor; Hendrickx, Eric (2019) -
Mask absorber for next generation EUV lithography
Wu, Meiyi; Thakare, Devesh; De Marneffe, Jean-Francois; Jaenen, Patrick; Souriau, Laurent; Opsomer, Karl; Soulie, Jean-Philippe; Erdmann, Andreas; Mesilhy, Hazem; Naujok, Philipp; Foltin, Markus; Soltwisch, Victor; Saadeh, Qais; Philipsen, Vicky (2020) -
Mask and wafer topography effects in immersion lithography
Erdmann, Andreas; Evanschitzky, Peter; De Bisschop, Peter (2005) -
Mitigating EUV mask 3D effects by alternative metal absorbers
Philipsen, Vicky; Luong, Vu; Hendrickx, Eric; Erdmann, Andreas; Dongbo, Xu; Evanschitzky, Peter; van de Kruijs, Robbert; Edrisi, Arash; Scholze, Frank; Laubis, Christian; Irmscher, Mathias; Naasz, Sandra (2016) -
Novel EUV mask absorber evaluation in support of next-generation EUV imaging
Philipsen, Vicky; Luong, Vu; Opsomer, Karl; Detavernier, Christophe; Hendrickx, Eric; Erdmann, Andreas; Evanschitzky, Peter; van de Kruijs, Robbert; Heidarnia-Fathabad, Zahra; Scholze, Frank; Laubis, Christian (2018) -
Perspectives and tradeoffs of absorber materials for high NA EUV lithography
Erdmann, Andreas; Mesilhy, Hazem; Evanschitzky, Peter; Philipsen, Vicky; Timmermans, Frank; Bauer, Markus (2020) -
Perspectives and tradeoffs of novel absorber materials for high NA EUV lithography
Erdmann, Andreas; Mesilhy, Hazem; Evanschitsky, Peter; Philipsen, Vicky; Timmermans, Frank; Bauer, Markus (2020) -
Precise optical constants: determination and impact on metrology, simulation and development of EUV masks
Saadeh, Qais; Mesilhy, Hazem; Soltwisch, Victor; Erdmann, Andreas; Ciesielski, Richard; Lohr, Leonhard; Andrle, Anna; Philipsen, Vicky; Thakare, Devesh; Laubis, Christian; Scholze, Frank; Kolbe, Michael (2022) -
Predictive modeling of EUV-lithography: the role of mask, optics, and photoresist effects
Erdmann, Andreas; Shao, Feng; Evanschitzky, Peter; Fuehner, Tim; Lorusso, Gian; Hendrickx, Eric; Goethals, Mieke; Jonckheere, Rik; Bret, Tristan; Hofmann, Thorsten (2011) -
Reducing EUV mask 3D effects by alternative metal absorbers
Philipsen, Vicky; Luong, Vu; Souriau, Laurent; Erdmann, Andreas; Xu, Dongbo; Evanschitzky, Peter; Van de Kruijs, Robbert; Edrisi, Arash; Scholze, Frank; Laubis, Christian; Irmscher, Mathias; Naasz, Sandra; Reuter, Christian; Hendrickx, Eric (2017) -
Simulation of polychromatic effects in high NA EUV lithography
Erdmann, Andreas; Mesilhy, Hazem; Evanschitzky, Peter; Saadeh, Qais; Soltwisch, Victor; Bihr, Simon; Zimmermann, Joerg; Philipsen, Vicky (2021) -
Simulation of the effect of a resist-surface bound air bubble on imaging in immersion lithography
De Bisschop, Peter; Erdmann, Andreas; Rathsfeld, Andreas (2005)