Reducing EUV mask 3D effects by alternative metal absorbers

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Authors

Philipsen, Vicky; Luong, Vu; Souriau, Laurent; Erdmann, Andreas; Xu, Dongbo; Evanschitzky, Peter; Van de Kruijs, Robbert; Edrisi, Arash; Scholze, Frank; Laubis, Christian; Irmscher, Mathias; Naasz, Sandra; Reuter, Christian; Hendrickx, Eric

DOI

10.1117/1.JMM.16.4.041002

ISSN

1932-5150

Issue

4

Journal

Journal of Micro/Nanolithography MEMS and MOEMS

Volume

16

Title

Reducing EUV mask 3D effects by alternative metal absorbers

Publication type

Journal article

Embargo date

9999-12-31

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