Reducing EUV mask 3D effects by alternative metal absorbers

Philipsen, Vicky; Luong, Vu; Souriau, Laurent; Erdmann, Andreas; Xu, Dongbo; Evanschitzky, Peter; Van de Kruijs, Robbert; Edrisi, Arash; Scholze, Frank; Laubis, Christian; Irmscher, Mathias; Naasz, Sandra; Reuter, Christian; Hendrickx, Eric

doi:10.1117/1.JMM.16.4.041002

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Reducing EUV mask 3D effects by alternative metal absorbers

Date

2017

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https://doi.org/10.1117/1.JMM.16.4.041002

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Van de Kruijs, Robbert

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Journal of Micro/Nanolithography MEMS and MOEMS

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Acq. date: 2026-01-09

Reducing EUV mask 3D effects by alternative metal absorbers

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