Publication:

Reducing EUV mask 3D effects by alternative metal absorbers

Date

2017
Journal article
https://doi.org/10.1117/1.JMM.16.4.041002
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36076.pdf 6.75 MB

Author(s)

Philipsen, Vicky  
;
Luong, Vu  
;
Souriau, Laurent  
;
Erdmann, Andreas
;
Xu, Dongbo  
;
Evanschitzky, Peter
;
Van de Kruijs, Robbert
;
Edrisi, Arash
;
Scholze, Frank
;
Laubis, Christian
;
Irmscher, Mathias
;
Naasz, Sandra
;
Reuter, Christian
;
Hendrickx, Eric  

Journal

Journal of Micro/Nanolithography MEMS and MOEMS

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2014 since deposited on 2021-10-24
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