Reducing EUV mask 3D effects by alternative metal absorbers

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36076.pdf 6.75 MB

Author(s)

Philipsen, Vicky

;

;

Souriau, Laurent

;

Erdmann, Andreas

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;

Evanschitzky, Peter

;

Van de Kruijs, Robbert

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;

;

Laubis, Christian

;

Irmscher, Mathias

;

;

Reuter, Christian

;

Hendrickx, Eric

Journal

Journal of Micro/Nanolithography MEMS and MOEMS

Metrics

2012 since deposited on 2021-10-24

Acq. date: 2025-10-23