Exploration of alternative absorber materials for EUV lithography: A simulation study

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Authors

Erdmann, Andreas; Evanschitzky, Peter; Xu, Dongbo; Luong, Vu; Philipsen, Vicky; Hendrickx, Eric

Conference

European Mask and Lithography Conference - EUVL

Title

Exploration of alternative absorber materials for EUV lithography: A simulation study

Publication type

Proceedings paper

Collections

Conference contributions