Publication:

Exploration of alternative absorber materials for EUV lithography: A simulation study

Date

2016
Proceedings Paper
Simple item page Full metadata Statistics
 
dc.contributor.authorErdmann, Andreas
dc.contributor.authorEvanschitzky, Peter
dc.contributor.authorXu, Dongbo
dc.contributor.authorLuong, Vu
dc.contributor.authorPhilipsen, Vicky
dc.contributor.authorHendrickx, Eric
dc.contributor.imecauthorXu, Dongbo
dc.contributor.imecauthorLuong, Vu
dc.contributor.imecauthorPhilipsen, Vicky
dc.contributor.imecauthorHendrickx, Eric
dc.contributor.orcidimecXu, Dongbo::0000-0003-1159-2315
dc.contributor.orcidimecPhilipsen, Vicky::0000-0002-2959-432X
dc.date.accessioned2021-10-23T10:46:16Z
dc.date.available2021-10-23T10:46:16Z
dc.date.issued2016
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/26604
dc.source.conferenceEuropean Mask and Lithography Conference - EUVL
dc.source.conferencedate21/06/2016
dc.source.conferencelocationDresden Germany
dc.title

Exploration of alternative absorber materials for EUV lithography: A simulation study

dc.typeProceedings paper
dspace.entity.typePublication
Files
Publication available in collections:
Conference contributions