Authors

Philipsen, Vicky; Luong, Vu; Opsomer, Karl; Souriau, Laurent; Rip, Jens; Detavernier, Christophe; Erdmann, Andreas; Evanschitzky, Peter; Laubis, Christian; Hoenicke, Philipp; Soltwisch, Victor; Hendrickx, Eric

Conference

Photomask Japan 2019: XXVI Symposium on Photomask and Next-Generation Lithography Mask Technology

Title

Mask absorber development to enable next-generation EUVL

Publication type

Proceedings paper