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Mask absorber development to enable next-generation EUVL
Publication:
Mask absorber development to enable next-generation EUVL
Date
2019
Proceedings Paper
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Basic data
APA
Chicago
Harvard
IEEE
Basic data
APA
Chicago
Harvard
IEEE
Author(s)
Philipsen, Vicky
;
Luong, Vu
;
Opsomer, Karl
;
Souriau, Laurent
;
Rip, Jens
;
Detavernier, Christophe
;
Erdmann, Andreas
;
Evanschitzky, Peter
;
Laubis, Christian
;
Hoenicke, Philipp
;
Soltwisch, Victor
;
Hendrickx, Eric
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1958
since deposited on 2021-10-27
Acq. date: 2025-10-24
Citations
Metrics
Views
1958
since deposited on 2021-10-27
Acq. date: 2025-10-24
Citations