Publication:

Mask absorber development to enable next-generation EUVL

Date

2019
Proceedings Paper
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dc.contributor.authorPhilipsen, Vicky
dc.contributor.authorLuong, Vu
dc.contributor.authorOpsomer, Karl
dc.contributor.authorSouriau, Laurent
dc.contributor.authorRip, Jens
dc.contributor.authorDetavernier, Christophe
dc.contributor.authorErdmann, Andreas
dc.contributor.authorEvanschitzky, Peter
dc.contributor.authorLaubis, Christian
dc.contributor.authorHoenicke, Philipp
dc.contributor.authorSoltwisch, Victor
dc.contributor.authorHendrickx, Eric
dc.contributor.imecauthorPhilipsen, Vicky
dc.contributor.imecauthorLuong, Vu
dc.contributor.imecauthorOpsomer, Karl
dc.contributor.imecauthorSouriau, Laurent
dc.contributor.imecauthorRip, Jens
dc.contributor.imecauthorHendrickx, Eric
dc.contributor.orcidimecPhilipsen, Vicky::0000-0002-2959-432X
dc.contributor.orcidimecSouriau, Laurent::0000-0002-5138-5938
dc.date.accessioned2021-10-27T16:01:47Z
dc.date.available2021-10-27T16:01:47Z
dc.date.issued2019
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/33794
dc.identifier.urlhttps://doi.org/10.1117/12.2537967
dc.source.beginpage111780F
dc.source.conferencePhotomask Japan 2019: XXVI Symposium on Photomask and Next-Generation Lithography Mask Technology
dc.source.conferencedate23/04/2019
dc.source.conferencelocationYokohama Japan
dc.title

Mask absorber development to enable next-generation EUVL

dc.typeProceedings paper
dspace.entity.typePublication
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