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Conference contributions
Simulation of the effect of a resist-surface bound air bubble on imaging in immersion lithography
Publication:
Simulation of the effect of a resist-surface bound air bubble on imaging in immersion lithography
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Date
2005
Proceedings Paper
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12015.pdf
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Basic data
APA
Chicago
Harvard
IEEE
Basic data
APA
Chicago
Harvard
IEEE
Author(s)
De Bisschop, Peter
;
Erdmann, Andreas
;
Rathsfeld, Andreas
Journal
Abstract
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1946
since deposited on 2021-10-16
Acq. date: 2025-12-11
Citations
Metrics
Views
1946
since deposited on 2021-10-16
Acq. date: 2025-12-11
Citations