Novel EUV mask absorber evaluation in support of next-generation EUV imaging

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Authors
Philipsen, Vicky; Luong, Vu; Opsomer, Karl; Detavernier, Christophe; Hendrickx, Eric; Erdmann, Andreas; Evanschitzky, Peter; van de Kruijs, Robbert; Heidarnia-Fathabad, Zahra; Scholze, Frank; Laubis, Christian
Conference
Photomask Technology 2018
Title
Novel EUV mask absorber evaluation in support of next-generation EUV imaging
Publication type
Proceedings paper
Embargo date
9999-12-31
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