Now showing items 1-3 of 3

    • Evaluation of Ta-Co alloys as novel high-k extreme ultraviolet mask absorber 

      Thakare, Devesh; Wu, Meiyi; Opsomer, Karl; Saadeh, Qais; Soltwisch, Victor; Naujok, Philipp; Detavernier, Christophe; Dattilo, Davide; Foltin, Markus; Goodyear, Andy; Cooke, Mike; Delabie, Annelies; Philipsen, Vicky (2023)
    • Mask absorber for next generation EUV lithography 

      Wu, Meiyi; Thakare, Devesh; De Marneffe, Jean-Francois; Jaenen, Patrick; Souriau, Laurent; Opsomer, Karl; Soulie, Jean-Philippe; Erdmann, Andreas; Mesilhy, Hazem; Naujok, Philipp; Foltin, Markus; Soltwisch, Victor; Saadeh, Qais; Philipsen, Vicky (2020)
    • Study of novel EUVL mask absorber candidates 

      Wu, Meiyi; Thakare, Devesh; De Marneffe, Jean-Francois; Jaenen, Patrick; Souriau, Laurent; Opsomer, Karl; Soulie, Jean-Philippe; Erdmann, Andreas; Mesilhy, Hazem; Naujok, Philipp; Foltin, Markus; Soltwisch, Victor; Saadeh, Qais; Philipsen, Vicky (2021)