Publication:

Mask absorber for next generation EUV lithography

Date

2020

Proceedings Paper

https://doi.org/10.1117/12.2572114

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Author(s)

;

Thakare, Devesh

;

de Marneffe, Jean-Francois

;

Jaenen, Patrick

;

Souriau, Laurent

;

;

Soulie, Jean-Philippe

;

Erdmann, Andreas

;

;

Naujok, Philipp

;

;

Soltwisch, Victor

;

;

Philipsen, Vicky

Journal

Proceedings of SPIE

Metrics

1833 since deposited on 2021-11-02

3last month

Acq. date: 2026-01-09