Publication:

Mask absorber for next generation EUV lithography

Date

2020
Proceedings Paper
https://doi.org/10.1117/12.2572114
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Author(s)

Wu, Meiyi  
;
Thakare, Devesh  
;
De Marneffe, Jean-Francois
;
Jaenen, Patrick  
;
Souriau, Laurent  
;
Opsomer, Karl  
;
Soulie, Jean-Philippe
;
Erdmann, Andreas
;
Mesilhy, Hazem
;
Naujok, Philipp
;
Foltin, Markus
;
Soltwisch, Victor
;
Saadeh, Qais
;
Philipsen, Vicky  

Journal

Proceedings of SPIE

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1828 since deposited on 2021-11-02
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