Browsing by author "Thakare, Devesh"
Now showing items 1-12 of 12
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Evaluation of Ta-Co alloys as novel high-k EUV mask absorber
Thakare, Devesh; Wu, Meiyi; Opsomer, Karl; Detavernier, Christophe; Naujok, Philipp; Saadeh, Qais; Soltwisch, Victor; Delabie, Annelies; Philipsen, Vicky (2022) -
Evaluation of Ta-Co alloys as novel high-k extreme ultraviolet mask absorber
Thakare, Devesh; Wu, Meiyi; Opsomer, Karl; Saadeh, Qais; Soltwisch, Victor; Naujok, Philipp; Detavernier, Christophe; Dattilo, Davide; Foltin, Markus; Goodyear, Andy; Cooke, Mike; Delabie, Annelies; Philipsen, Vicky (2023) -
First results of EUV-scanner compatibility tests performed on novel 'high-NA' reticle absorber materials
Stortelder, Jetske; Ebeling, Robert P.; Rijnsent, Corne; van Putten, Michel; de Rooij-Lohmann, Veronique; Smit, Maximilian; Storm, Arnold J.; Koster, Norbert; Lensen, Henk A.; Philipsen, Vicky; Opsomer, Karl; Thakare, Devesh; Feigl, Torsten; Naujok, Philipp (2021) -
Mask absorber for next generation EUV lithography
Wu, Meiyi; Thakare, Devesh; De Marneffe, Jean-Francois; Jaenen, Patrick; Souriau, Laurent; Opsomer, Karl; Soulie, Jean-Philippe; Erdmann, Andreas; Mesilhy, Hazem; Naujok, Philipp; Foltin, Markus; Soltwisch, Victor; Saadeh, Qais; Philipsen, Vicky (2020) -
Nested Sampling aided determination of tantalum optical constants in the EUV spectral range
Saadeh, Qais; Naujok, Philipp; Wu, Meiyi; Philipsen, Vicky; Thakare, Devesh; Scholze, Frank; Buchholz, Christian; Stadelhoff, Christian; Wiesner, Thomas; Soltwisch, Victor (2022) -
On the optical constants of cobalt in the M-absorption edge region
Saadeh, Qais; Naujok, Philipp; Thakare, Devesh; Wu, Meiyi; Philipsen, Vicky; Scholze, Frank; Buchholz, Christian; Salami, Zanyar; Abdulhadi, Yasser; Garcia, Danilo Ocana; Mentzel, Heiko; Babuschkin, Anja; Laubis, Christian; Soltwisch, Victor (2023) -
Optimizing EUV Imaging Metrics as a Function of Absorber Thickness and Illumination Source: Simulation Case Study of Ta-Co alloys
Philipsen, Vicky; Thakare, Devesh; Delabie, Annelies (2022) -
Optimizing extreme ultraviolet lithography imaging metrics as a function of absorber thickness and illumination source: a simulation case study of Ta-Co alloy
Thakare, Devesh; Delabie, Annelies; Philipsen, Vicky (2023) -
Precise optical constants: determination and impact on metrology, simulation and development of EUV masks
Saadeh, Qais; Mesilhy, Hazem; Soltwisch, Victor; Erdmann, Andreas; Ciesielski, Richard; Lohr, Leonhard; Andrle, Anna; Philipsen, Vicky; Thakare, Devesh; Laubis, Christian; Scholze, Frank; Kolbe, Michael (2022) -
Ru/Ta bilayer approach to EUV mask absorbers: Experimental patterning and simulated imaging perspective
Thakare, Devesh; de Marneffe, Jean-Francois; Delabie, Annelies; Philipsen, Vicky (2023) -
Study of novel EUVL mask absorber candidates
Wu, Meiyi; Thakare, Devesh; De Marneffe, Jean-Francois; Jaenen, Patrick; Souriau, Laurent; Opsomer, Karl; Soulie, Jean-Philippe; Erdmann, Andreas; Mesilhy, Hazem; Naujok, Philipp; Foltin, Markus; Soltwisch, Victor; Saadeh, Qais; Philipsen, Vicky (2021) -
Tunability of the optical constants of tantalum-cobalt alloy thin films in the extreme ultraviolet
Saadeh, Qais; Philipsen, Vicky; Thakare, Devesh; Naujok, Philipp; Wu, Meiyi; Scholze, Frank; Buchholz, Christian; Tagbo-fotso, Claudia; Babalik, Ayhan; Kupper, Bettina; Soltwisch, Victor (2023)