Toggle navigation
My submissions
Login
Toggle navigation
View item
imec Publications Repository
imec Publications
Articles
View item
imec Publications Repository
imec Publications
Articles
View item
JavaScript is disabled for your browser. Some features of this site may not work without it.
Ru/Ta bilayer approach to EUV mask absorbers: Experimental patterning and simulated imaging perspective
View/
open
Published version (9.568Mb)
Metadata
Show full item record
Authors
Thakare, Devesh
;
de Marneffe, Jean-Francois
;
Delabie, Annelies
;
Philipsen, Vicky
DOI
10.1016/j.mne.2023.100223
ISSN
2590-0072
Issue
September
Journal
MICRO AND NANO ENGINEERING
Volume
20
Title
Ru/Ta bilayer approach to EUV mask absorbers: Experimental patterning and simulated imaging perspective
Publication type
Journal article
Embargo date
2023-09-30
Collections
Articles
Version history
Version
Item
Date
Summary
2
20.500.12860/42662.2
*
2024-03-18T12:57:35Z
validation by library/open access desk
1
20.500.12860/42662
2023-10-07T17:32:42Z
*Selected version
Search imec Publications Repository
This collection
Browse
All of imec Publications Repository
Collections
Publication date
Authors
Titles
Subjects
imec author
Availability
Publication type
This collection
Publication date
Authors
Titles
Subjects
imec author
Availability
Publication type
My account
login