Browsing by author "Delabie, Annelies"
Now showing items 1-20 of 361
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300 mm-wafer characterization of ruthenium area-selective deposition in nanoscale line-space and hole patterns
Clerix, Jan-Willem; Delabie, Annelies; Hung, Joey; Warad, L.; Shah, Kavita (2020) -
300 mm-wafer metrology for area-selective deposition in nanoscale patterns: A case study for ruthenium atomic layer deposition
Clerix, Jan-Willem; Warad, L.; Hung, J.; Hody, Hubert; Van Roey, Frieda; Lorusso, Gian; Koret, R.; Lee, W. T.; Shah, K.; Delabie, Annelies (2023) -
A chemisorbed interfacial layer for seeding atomic layer deposition on graphite
Brown, Anton; Greenwood, John; Lockhart de la Rosa, Cesar Javier; Gonzalez, Miriam C. Rodriguez; Verguts, Ken; Brems, Steven; Zhang, Haodong; Hirsch, Brandon E.; De Gendt, Stefan; Delabie, Annelies; Caymax, Matty; Teyssandier, Joan; De Feyter, Steven (2021) -
A comparative study of the microstructure–dielectric properties of crystalline SrTiO3 ALD films obtained via seed layer approach
Popovici, Mihaela Ioana; Tomida, Kazuyuki; Swerts, Johan; Favia, Paola; Delabie, Annelies; Bender, Hugo; Adelmann, Christoph; Tielens, Hilde; Brijs, Bert; Kaczer, Ben; Pawlak, Malgorzata; Kim, Min-Soo; Altimime, Laith; Van Elshocht, Sven; Kittl, Jorge (2011) -
A deep-level transient spectroscopy study of silicon Schottky barriers containing a Si-O superlattice
Simoen, Eddy; Jayachandran, Suseendran; Delabie, Annelies; Caymax, Matty; Heyns, Marc (2017) -
A Dy2O3-capped HfO2 dielectric and TaCx-based metals enabling low-Vt single-metal-single-dielectric gate stack
Chang, Vincent; Ragnarsson, Lars-Ake; Pourtois, Geoffrey; O'Connor, Robert; Adelmann, Christoph; Van Elshocht, Sven; Delabie, Annelies; Swerts, Johan; Van der Heyden, Nikolaas; Conard, Thierry; Cho, Hag-Ju; Akheyar, Amal; Mitsuhashi, Riichirou; Witters, Thomas; O'Sullivan, Barry; Pantisano, Luigi; Rohr, Erika; Lehnen, Peer; Kubicek, Stefan; Schram, Tom; De Gendt, Stefan; Absil, Philippe; Biesemans, Serge (2007) -
A First-Principles Investigation of the Driving Forces Defining the Selectivity of TiO2 Atomic Layer Deposition
Kaneda, Yukio; Nye, Rachel; Marques, Esteban; Armini, Silvia; Delabie, Annelies; van Setten, Michiel; Pourtois, Geoffrey (2023) -
A method to pattern tight tip-to-tip in 32nm-pitch N5 interconnect using Ru area selective deposition tone inversion process
Briggs, Basoene; Soethoudt, Job; Delabie, Annelies; Wilson, Chris; Tokei, Zsolt; Boemmels, Juergen; Devriendt, Katia; Sebaai, Farid; Lorant, Christophe; Hody, Hubert (2018) -
Achieving conduction band-edge effective work functions by La2O3 capping of hafnium silicates
Ragnarsson, Lars-Ake; Chang, Vincent; Yu, HongYu; Cho, Hag-Ju; Conard, Thierry; Yin, KaiMin; Delabie, Annelies; Swerts, Johan; Schram, Tom; De Gendt, Stefan; Biesemans, Serge (2007-06) -
Advanced dielectrics targeting 2X DRAM MIM capacitors
Popovici, Mihaela Ioana; Swerts, Johan; Aoulaiche, Marc; Redolfi, Augusto; Kaczer, Ben; Kim, Min-Soo; Douhard, Bastien; Delabie, Annelies; Clima, Sergiu; Jurczak, Gosia; Van Elshocht, Sven (2013) -
Advanced surface preparation leading into the nano-era
Onsia, Bart; De Gendt, Stefan; Delabie, Annelies; Van Elshocht, Sven; Caymax, Matty; Conard, Thierry; Heyns, Marc; Lin, S.; Green, Martin; Tsai, Wilman (2003) -
Al2O3/InGaAs metal-oxide-semiconductor interface properties: impact of Gd2O3 and Sc2O3 interfacial layers by atomic layer deposition
Ameen, Mahmoud; Nyns, Laura; Sioncke, Sonja; Lin, Dennis; Ivanov, Tsvetan; Conard, Thierry; Meersschaut, Johan; Feteha, M. Y.; Van Elshocht, Sven; Delabie, Annelies (2014) -
ALCVD hafnium silicates for low power gate stacks
Maes, Jan; Laitinen, O.; De Witte, Hilde; Deweerd, Wim; Delabie, Annelies; Conard, Thierry; Brijs, Bert; Wang, C. - G.; Velasco, H.; Wilk, G. (2004) -
ALD and parasitic growth characteristics of the tetrakisethylmethylamino hafnium TEMAH/H2O process
Nyns, Laura; Delabie, Annelies; Swerts, Johan; Van Elshocht, Sven; De Gendt, Stefan (2010) -
ALD barrier deposition on porous low-k dielectric materials for interconnects
Van Elshocht, Sven; Delabie, Annelies; Dewilde, Sven; Meersschaut, Johan; Swerts, Johan; Tielens, Hilde; Verdonck, Patrick; Witters, Thomas; Vancoille, Eric (2011-10) -
ALD deposition of high-k and metal gate stacks for advanced CMOS applications
Heyns, Marc; Beckx, Stephan; Caymax, Matty; Claes, Martine; De Gendt, Stefan; Degraeve, Robin; Delabie, Annelies; Deweerd, Wim; Groeseneken, Guido; Hooker, Jacob; Houssa, Michel; Kwak, Dong Hwa; Lander, Rob; Lujan, Guilherme; Maes, Jan; Niwa, Masaaki; Pantisano, Luigi; Puurunen, R.; Ragnarsson, Lars-Ake; Rohr, Erika; Schram, Tom; Van Elshocht, Sven; Vandervorst, Wilfried (2004) -
ALD growth behavior of high-k nanolayers on various substrates characterized by X-Ray Spectrometry in gracing incidence geometry
Müller, Matthias; Sioncke, Sonja; Delabie, Annelies; Beckhoff, Burkhard (2013) -
ALD HfO2 surface preparation study
Delabie, Annelies; Caymax, Matty; Maes, Jan; Bajolet, Philippe; Brijs, Bert; Cartier, Eduard; Conard, Thierry; De Gendt, Stefan; Richard, Olivier; Vandervorst, Wilfried; Zhao, Chao; Green, Martin; Tsai, Wilman; Heyns, Marc (2003) -
ALD High-k growth on Ge substrates
Delabie, Annelies; Brijs, Bert; Caymax, Matty; Chiarella, Thomas; Conard, Thierry; Puurunen, Riikka; Richard, Olivier; Van Steenbergen, Jan; Teerlinck, Ivo; Zhao, Chao; Heyns, Marc; Meuris, Marc (2003) -
ALD La-based oxides for Vt-tuning in high-k/metal gate stacks
Swerts, Johan; Fedorenko, Yanina; Maes, Jan; Tois, E.; Delabie, Annelies; Ragnarsson, Lars-Ake; Yu, HongYu; Nyns, Laura; Adelmann, Christoph; Van Elshocht, Sven (2007)